The following experimental results are for the effect of C2F6 flow rate on the u

Question

The following experimental results are for the effect of C2F6 flow rate on the uniformity of the etch (in perce wafer used in integrated circuit manufacturing. Three flow rates were used. Six replicates were performed treatment. Observations C2F6 Flow (SCCM) 125 160 200 4 2.7 4.6 2.6 3.0 3.2 3.8 .9 4.6 5.0 4.2 3.6 4.2 .6 3.4 2.9 3.54.5.1 ANOVA MS P-value F Source of Variation Treatments Error 3.647778 7.63 2 15 Total 11.27778 17 Using the partial ANOVA results above, the treatment mean square (MSTR) is

Explanation / Answer

The treatment mean square (MSTR) is equal to

= Treatment SS / (r-1)

Here Treatment SS =3.647778

And r-1 =2

Therefore MSTR =3.647778/2

= 1.823

i.e. 1.82

Hence third option is correct

Related Questions

Navigate

• Browse (All)
• Browse T
• Subjects

---

---

Integrity-first tutoring: explanations and feedback only — we do not complete graded work. Learn more.