Indicate whether each of the following descriptions better applies to patterning

Question

Indicate whether each of the following descriptions better applies to patterning by lateral inhibition (L), reaction-diffusion systems (R), or sequential induction (S). Your answer would be a four-letter string composed of letters L. R. and S only, e g. SSRR It does NOT generate asymmetrical patterns from an initial noisy field. It is based on short-range activation and long-range inhibition. It can readily generate complex patterns resembling the spots of a leopard or stripes of a zebra. It is commonly mediated by Notch signaling.

Explanation / Answer

RSRL

Related Questions

Navigate

• Browse (All)
• Browse I
• Subjects

---

---

Integrity-first tutoring: explanations and feedback only — we do not complete graded work. Learn more.