A generic surface micromachining process is diagramed below, using two layers of

Question

A generic surface micromachining process is diagramed below, using two layers of structural and two layers of sacrificial materials. In this case, the substrate is glass, structural layer #1 is polycrystalline silicon, and structural layer #2 is gold. Identify a set of possible candidate materials for sacrificial layer #1 and #2 out of the list of the following materials: LPCVD silicon nitride, LPCVD silicon dioxide, photo resist, and evaporated gold thin film. Briefly state the reasoning behind the decision for each item in the list.

Explanation / Answer

element used in sacrificial layer 1 is evaporated gold thin film

element used in sacrificial layer 2 is LPCVD silicon nitride

because all the above material has higher resistivity and thin layer

so electron caan be transmitted

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